Sputtering target refers to a sputtering source that is sputtered and deposited on a substrate under appropriate process conditions by magnetron sputtering, multi-arc ion plating or other types of coating equipment to form various functional films. According to the composition, targets can be divided into pure metal targets, alloy targets, oxide targets, silicide targets, etc.; according to the shape, they can be divided into planar targets (rectangular targets and arc targets) and tubular targets. . Sputtering targets are widely used in many fields such as decoration, tools and molds, glass, electronic devices, semiconductors, magnetic recording, flat displays, solar cells, etc. Different fields require different target materials.
1. Decorative coating
Decorative coating mainly refers to the surface coating of mobile phones, watches, glasses, sanitary ware, hardware parts and other products. It not only plays a role in beautifying the color, but also has wear resistance, corrosion resistance and other functions. The main varieties of targets for decorative coating include: chromium target, titanium target, zirconium target, nickel target, tungsten target, titanium-aluminum target, stainless steel target, etc.
2. Coating of processing molds or tools
It is mainly used for surface strengthening of tools and molds, which can significantly improve the service life of tools and molds and the quality of processed parts. In recent years, driven by the development of the aerospace and automotive industries, the technical level and production efficiency of the global manufacturing industry have made great progress, and the demand for high-performance cutting tools and molds is increasing day by day. The main types of targets used for mold coating include: titanium-aluminum targets, chromium targets, titanium targets, etc.
3. Glass coating
The application of target materials on glass is mainly to produce low-radiation coated glass, which uses the principle of magnetron sputtering to sputter multiple layers of thin films on glass to achieve the functions of energy saving, light control and decoration. The main types of targets include: silver target, chromium target, titanium target, nickel-chromium target, silicon-aluminum target, titanium oxide target, etc. Another important application of target materials on glass is the preparation of automobile rearview mirrors, mainly chromium targets, aluminum targets, titanium oxide targets, etc. As the grade requirements for automobile rearview mirrors continue to increase, many companies have switched from the original aluminum plating process to the vacuum sputtering chrome plating process.
4. Electronic device coating
Electronic device coatings are mainly used for thin film resistors and thin film capacitors. Target materials for thin film resistors include NiCr target, nickel chromium silicon (NiCrSi) target, chromium silicon (CrSi) target, tantalum (Ta) target, nickel chromium aluminum (NiCrA1) target, etc.
5. Flat display coating
The rapid growth in demand for flat panel display devices from portable personal computers, televisions, mobile phones, etc. has greatly promoted the development of various types of flat panel display devices. Its types include: liquid crystal display device (LCD), plasma display device (PDP), etc. All these flat panel display devices use various types of films. Without thin film technology, there would be no flat panel display devices. In order to ensure the uniformity of large-area coatings, improve productivity and reduce costs, sputtering technology is increasingly used to prepare these coatings. The main types of targets used for flat display coating include: chromium targets, molybdenum targets, aluminum alloy targets, copper targets, etc.
6. Semiconductor coating
The rapid development of information technology requires integrated circuits to be more and more integrated. Each unit device is composed of a substrate, an insulating layer, a dielectric layer, a conductor layer and a protective layer. Among them, the dielectric layer, the conductor layer and even the protective layer The sputtering coating process is used, so the sputtering target is one of the core materials for preparing integrated circuits. Target materials for semiconductor coating require high target purity, generally above 4N or 5N. The main varieties include tungsten-titanium, titanium targets, aluminum targets and copper targets.
