PVD Target Aluminum Al Cylindrical Rotatable Sputter Target 99.999% Pure (2N-5N)

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Titanium Sputtering Target

FANMETAL supply Pure 99.999% Titanium Sputtering Target. Purity from 99.5% to 99.9999%. At present, for the 4-megabit VLSI, the purity of titanium is required to reach 4N5 (99.995%) ~ 5N (99.999%), while the 16-megabit third-generation VLSI requires the purity of titanium to reach 6N ( 99.9999%) level.

We also provide the metal target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )

Titanium Sputtering Target Picture:

The main applications of Titanium Sputtering Target include:

1. Biological materials

Titanium is a non-magnetic metal and will not be magnetized in a strong magnetic field. It has good compatibility with the human body and has no toxic side effects. It can be used to manufacture human implant devices. Generally, medical titanium materials do not reach the level of high-purity titanium, but considering the dissolution of impurities in titanium, the purity of titanium for implants should be as high as possible. The literature also mentions that high-purity titanium wire can be used as a biological strapping material. In addition, the titanium injection needle with the embedded catheter has also reached the high-purity titanium level.

2. Decoration materials

High-purity titanium has excellent atmospheric corrosion resistance, and will not change color after long-term use in the atmosphere, ensuring the original color of titanium. Therefore, high-purity titanium can also be used as building decoration materials. In addition, in recent years, some high-end decorations and some wearing articles, such as bracelets, watches and spectacle frames, are made of titanium, which utilizes the characteristics of corrosion resistance, discoloration, long-term maintenance of good gloss, and non-sensitization in contact with human skin. The purity of titanium used in some decorations has reached the 5N level.

3. Aspirated material

Titanium, as a very active metal with chemical properties, can react with many elements and compounds at high temperatures. High-purity titanium has a strong adsorption of active gases (such as O2, N2, CO, CO2, and water vapor above 650℃). The Ti film evaporated on the pump wall can form a surface with high adsorption capacity. This property makes Ti is widely used as a getter in ultra-high vacuum pumping systems. If used in sublimation pumps, sputtering ion pumps, etc., the ultimate working pressure of the sputtering ion pump can be as low as 10-9Pa.

4. Electronic information materials

In recent years, with the rapid development of high-tech fields such as semiconductor technology and information technology, the amount of high-purity titanium used in sputtering targets (see Figure 1), integrated circuits, DRAMs and flat panel displays has increased. The purity requirements of the materials are getting higher and higher. In the semiconductor VLSI industry, titanium silicon compounds, titanium nitrogen compounds, tungsten titanium compounds, etc. are used as diffusion barriers and wiring materials for the control electrodes. The sputtering method is used to manufacture these materials, and the titanium target used in the sputtering method requires high purity, especially for alkali metal elements and radioactive elements.

In recent years, its matching sputtering equipment has also begun to use high-purity titanium with the same purity as the sputtering titanium target.

We always regard the production of high-quality PVD Target Aluminum Al Cylindrical Rotatable Sputter Target 99.999% Pure (2N-5N) as the foundation of the enterprise and take improving the product quality and enhancing theresearch and development ability as the development direction of the enterprise. Our company adheres to 'people-oriented', takes the road of science and technology, adheres to innovation and development and adheres to market orientation. We keep tapping into the potential to improve internal management, collaborate and innovate to improve the competitiveness of our company.

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