Research Titanium Dioxide Target Magnetron Sputtering Target
Product Introduction
With the business philosophy of 'creating enterprise products with quality and winning customers with reputation', we are willing to establish good and long-term close cooperative relations with customers at home and abroad, and strive for the development of Pure Iridium, Tungsten Carbide Button Teeth, Pure Iridium Sputtering Target industry. Our employees have strong professional dedication, high sense of responsibility, excellent service attitude, innovative spirit of reform and overall concept of unity and cooperation. With a broad, open global vision and a high degree of cohesion and contribution, we strive to create better product value for our customers with newer, better quality products and faster, better service. We've a skilled sales team, they have mastered the best technology and manufacturing processes, have years of experience in foreign trade sales, with customers able to communicate seamlessly and accurately understand the real needs of customers, providing customers with personalized service and unique merchandise. After years of accumulation, we have gained wide attention and recognition, forming a unique advantage in the industry.
Titanium Silicon Sputtering Target
FANMETAL supply the Ti-Si alloy titanium silicon sputtering target used in PVD coating system. TiSi alloy compostion: 85:15at% 80:20at% 75:25at% . We also provide the metal target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )
Magnetron sputtering coating is a new type of physical vapor coating method. It uses an electron gun system to emit and focus electrons on the material to be plated, so that the sputtered atoms follow the principle of momentum conversion and leave the material with higher kinetic energy. Fly to the substrate to deposit a film. This material to be plated is called a sputtering target. Sputtering targets include metals, alloys, and ceramic compounds.
Titanium Silicon Sputtering Target Picture:
Types | Chemical Comp. | Purity | Shapes | Processing |
Aluminum Based Alloys | Al-Mg | 3N,4N | Ingot, Particle, Target | Vacuum Melting |
Al-Si | 4N | Ingot, Particle, Target | Vacuum Melting | |
Al-Si-Mg | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Al-Si-Cu | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Zn-Al | 4N | Ingot, Particle, Target | Vacuum Melting | |
Cobalt Based Alloys | Co-Cr | 3N,4N | Ingot, Particle, Target | Vacuum Melting |
Co-Fe | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Co-Ni | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Co-Ni-Cr | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Nickel Based Alloys | Ni-Cr | 3N5 | Ingot, Particle, Target | Vacuum Melting |
Ni-Co | 4N | Ingot, Particle, Target | Vacuum Melting | |
Ni-Cu | 4N | Ingot, Particle, Target | Vacuum Melting | |
Ni-Cr-Al | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Ni-Cr-Al-Si | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Ni-Cr-Si | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Ni-Fe | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Ni-V | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Titanium Based Alloys | Ti-Al | 4N | Ingot, Particle, Target | Hot Isostatic Pressing |
Ti-Cr | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Ti-Si | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Ti-Zr | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
W-Ti | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Other Alloys | Cr-Si | 3N,4N | Ingot, Particle, Target | Special Sintering |
Cr-V | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Fe-Mn | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Fe-Co-B | 3N,4N | Ingot, Particle, Target | Special Sintering | |
In-Sn | 3N,4N | Ingot, Particle, Target | Vacuum Melting | |
Zr-Fe | 3N,4N | Ingot, Particle, Target | Vacuum Melting |
Dedicating high-quality and high-tech Research Titanium Dioxide Target Magnetron Sputtering Target equipment to customers has always been our goal and purpose. The courage to develop, forge ahead, and innovate continuously are the driving force and source of our vigorous development. We will be high-quality Our products and excellent service will work together with you to create a better tomorrow! The construction of excellent corporate culture and the formation of the soft power and spiritual motive force of enterprise development are the major propositions that our company is striving for. The company has always adhered to the quality concept of products such as character and quality as life, and further strengthened management on the basis of having passed the quality management system.
Hot Tags: Titanium Silicon Sputtering Target, suppliers, manufacturers, factory, customized, wholesale, price, quotation, for sale, Ceramic Sputtering Target, tungsten steel ball, Vanadium Rod Stock, ultrafine tungsten wire, C14500 Tellurium Copper, Tungsten Heavy Alloy Balls
[[ProKeywords]]SPEC DATA
Send Inquiry