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Research Titanium Dioxide Target Magnetron Sputtering Target

Research Titanium Dioxide Target Magnetron Sputtering Target

FANMETAL supply the Ti-Si alloy titanium silicon sputtering target used in PVD coating system. TiSi alloy compostion: 85:15at% 80:20at% 75:25at% . We also provide the metal target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )
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Product Details of Research Titanium Dioxide Target Magnetron Sputtering Target

Product Introduction

With the business philosophy of 'creating enterprise products with quality and winning customers with reputation', we are willing to establish good and long-term close cooperative relations with customers at home and abroad, and strive for the development of Pure Iridium, Tungsten Carbide Button Teeth, Pure Iridium Sputtering Target industry. Our employees have strong professional dedication, high sense of responsibility, excellent service attitude, innovative spirit of reform and overall concept of unity and cooperation. With a broad, open global vision and a high degree of cohesion and contribution, we strive to create better product value for our customers with newer, better quality products and faster, better service. We've a skilled sales team, they have mastered the best technology and manufacturing processes, have years of experience in foreign trade sales, with customers able to communicate seamlessly and accurately understand the real needs of customers, providing customers with personalized service and unique merchandise. After years of accumulation, we have gained wide attention and recognition, forming a unique advantage in the industry.

Titanium Silicon Sputtering Target

FANMETAL supply the Ti-Si alloy titanium silicon sputtering target used in PVD coating system. TiSi alloy compostion: 85:15at% 80:20at% 75:25at% . We also provide the metal target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )


Magnetron sputtering coating is a new type of physical vapor coating method. It uses an electron gun system to emit and focus electrons on the material to be plated, so that the sputtered atoms follow the principle of momentum conversion and leave the material with higher kinetic energy. Fly to the substrate to deposit a film. This material to be plated is called a sputtering target. Sputtering targets include metals, alloys, and ceramic compounds.

Titanium Silicon Sputtering Target Picture:

Types

Chemical Comp.

Purity

Shapes

Processing

Aluminum Based Alloys

Al-Mg

3N,4N

Ingot, Particle, Target

Vacuum Melting

Al-Si

4N

Ingot, Particle, Target

Vacuum Melting

Al-Si-Mg

3N,4N

Ingot, Particle, Target

Vacuum Melting

Al-Si-Cu

3N,4N

Ingot, Particle, Target

Vacuum Melting

Zn-Al

4N

Ingot, Particle, Target

Vacuum Melting

Cobalt Based Alloys

Co-Cr

3N,4N

Ingot, Particle, Target

Vacuum Melting

Co-Fe

3N,4N

Ingot, Particle, Target

Vacuum Melting

Co-Ni

3N,4N

Ingot, Particle, Target

Vacuum Melting

Co-Ni-Cr

3N,4N

Ingot, Particle, Target

Vacuum Melting

Nickel Based Alloys

Ni-Cr

3N5

Ingot, Particle, Target

Vacuum Melting

Ni-Co

4N

Ingot, Particle, Target

Vacuum Melting

Ni-Cu

4N

Ingot, Particle, Target

Vacuum Melting

Ni-Cr-Al

3N,4N

Ingot, Particle, Target

Vacuum Melting

Ni-Cr-Al-Si

3N,4N

Ingot, Particle, Target

Vacuum Melting

Ni-Cr-Si

3N,4N

Ingot, Particle, Target

Vacuum Melting

Ni-Fe

3N,4N

Ingot, Particle, Target

Vacuum Melting

Ni-V

3N,4N

Ingot, Particle, Target

Vacuum Melting

Titanium Based Alloys

Ti-Al

4N

Ingot, Particle, Target

Hot Isostatic Pressing

Ti-Cr

3N,4N

Ingot, Particle, Target

Vacuum Melting

Ti-Si

3N,4N

Ingot, Particle, Target

Vacuum Melting

Ti-Zr

3N,4N

Ingot, Particle, Target

Vacuum Melting

W-Ti

3N,4N

Ingot, Particle, Target

Vacuum Melting

Other Alloys

Cr-Si

3N,4N

Ingot, Particle, Target

Special Sintering

Cr-V

3N,4N

Ingot, Particle, Target

Vacuum Melting

Fe-Mn

3N,4N

Ingot, Particle, Target

Vacuum Melting

Fe-Co-B

3N,4N

Ingot, Particle, Target

Special Sintering

In-Sn

3N,4N

Ingot, Particle, Target

Vacuum Melting

Zr-Fe

3N,4N

Ingot, Particle, Target

Vacuum Melting



Dedicating high-quality and high-tech Research Titanium Dioxide Target Magnetron Sputtering Target equipment to customers has always been our goal and purpose. The courage to develop, forge ahead, and innovate continuously are the driving force and source of our vigorous development. We will be high-quality Our products and excellent service will work together with you to create a better tomorrow! The construction of excellent corporate culture and the formation of the soft power and spiritual motive force of enterprise development are the major propositions that our company is striving for. The company has always adhered to the quality concept of products such as character and quality as life, and further strengthened management on the basis of having passed the quality management system.

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