ACETRON High Purity Zirconium Titanium Oxide ZrO2+TiO2 Granules Evaporation Materials/Sputtering Target

We always pay attention to the frontier of the Tungsten Rhenium Alloy, Tungsten Carbide Pipe, Tungsten Rhenium Alloy Wire industry and implement internal process reengineering and product innovation. Besides, we have a group of high-quality management personnels and professionals, who make the high-quality products and have the ability to develop new products to expand our market home and abroad. We believe in: Innovation is our soul and spirit.

Zirconium Sputtering Target

FANMETAL supply the Zirconium Sputtering Target used in PVD coating system. Material pure zirconium Zr702. We also provide other metal target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )

Description:

Zirconium is a strong transition metal with properties similar to the metal hafnium.Zirconium has a high melting point, strong heat resistance,and small neutron absorption cross-section,so it is very suitable for the manufacture of nuclear reactors. Zirconium metal is also particularly resistant to acid,alkali and seawater corrosion,and is often used as a corrosive and alloying agent in the chemical and metallurgical industries. zirconium sputtering target is often prepared by the fusion method,and the zirconium ingot is an ideal material for the production of the sputtering target.

Application:

Zirconium Sputtering Target is used for thin film deposition, fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Zirconium Sputtering Targets are usually used in a wide range of decorative coatings, hardware tool coatings,semiconductor and optical coatings and other fields.The light golden film made of zirconium sputtering target has the advantages of high purity, corrosion resistance, fine grain size, low impurity content, and permanent gloss on the surface.It is often used in daily necessities industry such as watches, tableware, car rearview mirrors, bathroom,etc.

FANMETAL can provide two grades of high-purity zirconium sputtering targets: low hafnium (0.025% hafnium content) and high hafnium.

Zirconium Sputtering Target Picture;

Sputtering target (purity: 99.9%-99.999%)

Metal target:

Nickel target, Ni, titanium target, Ti, zinc target, Zn, chromium target, Cr, magnesium target, Mg, niobium target, Nb, tin target, Sn, aluminum target, Al, indium target, In, iron target, Fe, Zirconium aluminum target, ZrAl, titanium aluminum target, TiAl, zirconium target, Zr, aluminum silicon target, AlSi Etc

The ACETRON High Purity Zirconium Titanium Oxide ZrO2+TiO2 Granules Evaporation Materials/Sputtering Target of our company is dependable in quality, competitive in prices, excellent in quality and sustainable. We innovate the concept of talent, with an inclusive and open-minded approach to the selection of talent without restriction. We pay attention to details and accumulate research and development on the application of new technologies, accumulate rich experience, and continuously improve manufacturing capabilities and product performance.

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