3n/4n/4n5 PVD Coating Mterials Wti Tungsten Titanium Alloy Sputtering Target

Through reasonable process layout, efficient production process and advanced testing equipment, we ensure that each Pure Iridium Electrode, Tungsten Copper Electrode, C15760 Copper Alloy can reach the first-class level. We believe that with the joint efforts of all employees, we will be able to seize opportunities, meet challenges and create new performance. We insist that we should not only meet customers' expectations, but also exceed them. We should not only provide one-time service, but also provide continuous service.

Tungsten Titanium Sputtering Target

FANMETAL supply the W-Ti alloy tungsten aluminum sputtering target used in PVD coating system in the field of semiconductor . Ti content 10%~50% , normally we supply the WTi 90:10 composition . We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )

Tungsten Titanium Sputtering Target Process:

HP hot press sintering, high pressure and high temperature insulation, produce good density tungsten titanium alloy. Density reaches over 99.5%, precision machining, good density, good purity, and good surface finish.

The main reason why the semiconductor chip to choose new target tungsten titanium alloy barrier layer and as a diffusion bonding layer is the alloy having good surface adhesion ability and excellent heat dissipation characteristics. In this way, the prepared product will have a higher comprehensive performance.

Tungsten Titanium Sputtering Target Description:

Tungsten Titanium Sputtering Target is an alloy that has the advantages of transition metals tungsten and titanium. It has higher density and purity, better corrosion resistance, and smaller volume expansion effects, which can effectively reduce the number of changes in the manufacturing process. The formation of medium particles can successfully prepare high-quality films.

Tungsten titanium alloy materials are produced by hot pressing (HP) or hot isostatic pressing (HIP).They contain all the advantages of tungsten and titanium,such as high strength,low resistivity,low elastic modulus,excellent corrosion and oxidation resistance, good thermal stability,low electron mobility,etc.Tungsten titanium sputtering targets produced by FANMETAL have the characteristics of high purity,high hardness,stable performance,strong operability,smooth surface and attractive metallic luster.

Tungsten Titanium Sputtering Target Application：

Tungsten titanium sputtering targets are widely used in the electronic communication industry,coating processing industry and coating industry,such as semiconductors, displays,optical discs, clocks,automotive glass and architectural glass,optical communications and other fields.High-purity tungsten titanium sputtering targets generally use magnetron sputtering to prepare various thin-film materials,which can be used as gate,connection and barrier materials in the electronics industry,as well as decorative layers for notebook computers and resistance layer in ultra-large-scale integrated circuits. Tungsten titanium sputtering targets, as an ideal thin film material with excellent performance,have good market prospects and economic benefits.

Tungsten Titanium Sputtering Target Specifications:

Tungsten Titanium Sputtering Target Pictures:

Our company adheres to independent innovation, and constantly develops new 3n/4n/4n5 PVD Coating Mterials Wti Tungsten Titanium Alloy Sputtering Target according to market changes and customer needs. In recent years, we have achieved not only the increasing strength of the team, but also the growth of brand influence. We encourage innovation, dare to change and never fear to face difficulties.

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