ACETRON High Purity Zirconium Oxide Aluminum Granules Evaporation Material/Sputtering Target

We have never forgotten to continuously optimize our Zr 702 Zirconium, Mow Molybdenum Alloy, Pure 99 999 Titanium Sputtering Target and are committed to developing products with independent intellectual property rights and representing high standards in the industry. We firmly believe that cooperation is a team spirit of voluntary cooperation and collaborative efforts revealed to achieve the set goals. In order to obtain the market competitive advantage, we need to constantly adjust the strategy and management mode, constantly adopt new technology and new equipment, and constantly improve the operation efficiency of equipment. Our company has always adhered to the 'science and technology is productivity' as the foundation of enterprise development, and vigorously advocated the modern business philosophy of technological innovation, management innovation and service innovation. We will sincerely cooperate with domestic and foreign customers with high-quality products, preferential prices, and excellent services for mutual benefit and win-win.

Zirconium Sputtering Target

FANMETAL supply the Zirconium Sputtering Target used in PVD coating system. Material pure zirconium Zr702. We also provide other metal target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )

Description:

Zirconium is a strong transition metal with properties similar to the metal hafnium.Zirconium has a high melting point, strong heat resistance,and small neutron absorption cross-section,so it is very suitable for the manufacture of nuclear reactors. Zirconium metal is also particularly resistant to acid,alkali and seawater corrosion,and is often used as a corrosive and alloying agent in the chemical and metallurgical industries. zirconium sputtering target is often prepared by the fusion method,and the zirconium ingot is an ideal material for the production of the sputtering target.

Application:

Zirconium Sputtering Target is used for thin film deposition, fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Zirconium Sputtering Targets are usually used in a wide range of decorative coatings, hardware tool coatings,semiconductor and optical coatings and other fields.The light golden film made of zirconium sputtering target has the advantages of high purity, corrosion resistance, fine grain size, low impurity content, and permanent gloss on the surface.It is often used in daily necessities industry such as watches, tableware, car rearview mirrors, bathroom,etc.

FANMETAL can provide two grades of high-purity zirconium sputtering targets: low hafnium (0.025% hafnium content) and high hafnium.

Zirconium Sputtering Target Picture;

Sputtering target (purity: 99.9%-99.999%)

Metal target:

Nickel target, Ni, titanium target, Ti, zinc target, Zn, chromium target, Cr, magnesium target, Mg, niobium target, Nb, tin target, Sn, aluminum target, Al, indium target, In, iron target, Fe, Zirconium aluminum target, ZrAl, titanium aluminum target, TiAl, zirconium target, Zr, aluminum silicon target, AlSi Etc

We have advanced testing equipment and perfect technical means to ensure the superior product performance of ACETRON High Purity Zirconium Oxide Aluminum Granules Evaporation Material/Sputtering Target. We adhere to the scientific concept of development, take the road of sustainable development, and assume economic and social responsibilities. We are honest and trustworthy, consistent in word and deed, and abide by professional ethics, and we have a strong sense of responsibility.

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