
ACETRON High Purity Zirconium+Aluminum Oxide Evaporation Material/Sputtering Target
Product Introduction
We do everything possible to improve our product quality, service and management level, and continue to provide customers with cost-effective, high-quality Elkonite Tungsten Copper Alloy, Tungsten Rhenium Alloy, Stellite Rod and good services. In the changing environment and rapid development process, our company always adhere to the customer value oriented business. We will actively promote the equal introduction of technical means and achieve win-win results for all parties. We are always ready to solve problems for our customers and provide the best solutions. We need to unite and cooperate, and constantly exceed the organizational structure and geographic restrictions to meet the ever-changing needs of customers.
Zirconium Sputtering Target
FANMETAL supply the Zirconium Sputtering Target used in PVD coating system. Material pure zirconium Zr702. We also provide other metal target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )
Description:
Zirconium is a strong transition metal with properties similar to the metal hafnium.Zirconium has a high melting point, strong heat resistance,and small neutron absorption cross-section,so it is very suitable for the manufacture of nuclear reactors. Zirconium metal is also particularly resistant to acid,alkali and seawater corrosion,and is often used as a corrosive and alloying agent in the chemical and metallurgical industries. zirconium sputtering target is often prepared by the fusion method,and the zirconium ingot is an ideal material for the production of the sputtering target.
Application:
Zirconium Sputtering Target is used for thin film deposition, fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Zirconium Sputtering Targets are usually used in a wide range of decorative coatings, hardware tool coatings,semiconductor and optical coatings and other fields.The light golden film made of zirconium sputtering target has the advantages of high purity, corrosion resistance, fine grain size, low impurity content, and permanent gloss on the surface.It is often used in daily necessities industry such as watches, tableware, car rearview mirrors, bathroom,etc.
FANMETAL can provide two grades of high-purity zirconium sputtering targets: low hafnium (0.025% hafnium content) and high hafnium.
Zirconium (Zr) Series Sputtering Target/Cathode | |||
Item | Material | Purities | Application |
Zr | Zirconium | 99.2-99.95% | Glass, decoration, hard coating |
Other Zr | Zirconium and alloys ZrAl, ZrSi etc | 99.0-99.95% | Others |
Zirconium Sputtering Target Picture;


Sputtering target (purity: 99.9%-99.999%)
Metal target:
Nickel target, Ni, titanium target, Ti, zinc target, Zn, chromium target, Cr, magnesium target, Mg, niobium target, Nb, tin target, Sn, aluminum target, Al, indium target, In, iron target, Fe, Zirconium aluminum target, ZrAl, titanium aluminum target, TiAl, zirconium target, Zr, aluminum silicon target, AlSi Etc
We have the courage to develop and innovate, the product quality is stable and reliable, and the economic efficiency is continuously improved. Now we have developed into a well-known ACETRON High Purity Zirconium+Aluminum Oxide Evaporation Material/Sputtering Target manufacturer in the industry On the basis of absorbing advanced technology and technology at home and abroad, and integrating the wisdom and experience of scientific researchers, the stability and reliability of our products are at the leading level in the industry. Our company has a modern plant equipped with various equipments required for advanced production, testing and inspection in order to pursue more exquisite craftsmanship and guarantee product quality.
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