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ACETRON 3N 99.9% High Purity Titanium+Aluminum Round Target for Vacuum/PVD Coating

ACETRON 3N 99.9% High Purity Titanium+Aluminum Round Target for Vacuum/PVD Coating

​FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )
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Product Details of ACETRON 3N 99.9% High Purity Titanium+Aluminum Round Target for Vacuum/PVD Coating

Product Introduction

Based on the present and looking into the future, we will provide customers with high-quality Ti si Alloy Titanium Silicon Sputtering Target, Pure Molybdenum Crucible, Copper Seam Welding Wheels with strict management, superior quality and honest service. We sincerely welcome people from all walks of life at home and abroad to join hands in creating the glory of the 21st century! We strive to achieve business scale breakthrough and sustained growth in performance.

FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )


The quality requirements of Titanium Aluminum Sputtering Target materials are higher than those of the traditional material industry. General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size and defect control; higher requirements or Special requirements include: surface roughness, resistance value, uniformity of grain size, uniformity of composition and structure, foreign matter (oxide) content and size, permeability, ultra-high density and ultra-fine grains, etc.

Titanium Aluminum Sputtering Target Picture:

Titanium Aluminum Sputtering Target

High Quality Titanium Aluminum Round Sputtering Target

Titanium Aluminum Sputtering Target Description

Purity

Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%,

AlTi 95/5wt%, AlTi 90/10wt%

Shape

Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm)
Rectangle, Sheet,

(Length ≤1000mm, Width ≤300mm, Thickness ≥1mm)
Tube( Diameter< 300mm, Thickness >2mm

Certification

ISO 9001:2008

Specification

Customized as request

Process

Forged , Rolling , Grinding

Application

1. Electroplating;

2. Chemical engineering & Petrochemical technology;

3. Medical

Density

4.51g/cm3

 

 

 

We appreciate the consistent support from all walks of life and feel the trust and love of our customers and the ACETRON 3N 99.9% High Purity Titanium+Aluminum Round Target for Vacuum/PVD Coating industry. We should follow the trend and actively face the challenges from international enterprises to pursue a win-win situation. We actively integrate our resources and advantages in the hope of bringing new profit growth points for the company.

Hot Tags: Titanium Aluminum Sputtering Target, suppliers, manufacturers, factory, customized, wholesale, price, quotation, for sale, High Purity Molybdenum Electrodes, Copper Tungsten Alloy Bar, iridium round bar, Tungsten Rod For Stainless Steel, Hastelloy C276 Alloy Pipe, Tungsten Heavy Alloy Balls

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