Pure Tantalum Disc

Pure Tantalum Disc Description & Application Tantalum is very ductile, malleable and machinable and can withstand various processes such as rolling, cold forging, punching or drawing. Pure Tantalum Disc has the characteristics of high purity, high hardness, easy manufacture, excellent...

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Pure Tantalum Disc Description & Application

Tantalum is very ductile, malleable and machinable and can withstand various processes such as rolling, cold forging, punching or drawing. Pure Tantalum Disc has the characteristics of high purity, high hardness, easy manufacture, excellent corrosion resistance, high temperature resistance, good welding performance and long service life. Our company mainly adopts vacuum electron furnace melting technology, utilizes unique rolling process, and produces high-quality pure tantalum discs through complex heat treatment and precise annealing temperature and time. Pure Tantalum Discs can be used as tantalum sputtering targets in semiconductor industry, glass coating industry and optical communication industry. With the increasing demand for tantalum products, the application range of tantalum is also wider, involving medical, chemical, military, electronics, machining, ceramics, atomic energy industry, aerospace, chemical laboratories and teaching.

Pure Tantalum Disc Specifications:

Grade	C	O	N	H	Fe	Mo	Nb	Ni	Si	Ti	W
Tantalum	0.01 max	0.015 max	0.01	0.0015 max	0.01 max	0.02	0.1 max	0.01 max	0.005 max	0.01	0.05

Grade	Ta1,Ta2,R05200,R05400,R05252
Purity	Ta≥99.95%-99.999%
Technique	Hot rolled,Cold rolled,Cutting,Forming Drilling,Machining,Grinding,Polishing
Diameter	Φ15mm-400mm
Density	≥16.1g/cm³
Thickness	3mm-30mm
Melting point	3017℃
Surface	Black,Alkaline Cleaning,Polished,Bright
Delivery time	15-20 days
Standard	ASTM B708,ASTM B521,AMS 5708,GB/T 3628
Certification	ISO9001

Pure Tantalum Disc Pictures:

China Pure Tantalum Disc

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