High Purity Hafnium Wires

High Purity Hafnium Wires Description

Plasma cutting with different working gases can cut all kinds of metals that are difficult to cut by oxygen cutting, especially for non-ferrous metals (stainless steel, aluminum, copper, titanium, nickel). The electrode body of the ion cutting head is copper, and the middle The core has two kinds of hafnium wire and zirconium wire. The manufacture of High Purity Hafnium Wire requires processes such as high-temperature forging, rolling, swaging, wire drawing and polishing, and must be purified in an electron beam furnace before processing. High Purity Hafnium Wire has the characteristics of high melting point, high thermal and electrical conductivity, strong oxidation resistance, and low electron emission performance, which can help plasma cutting machines to exert excellent performance and further improve processing accuracy and efficiency. In addition, High Purity Hafnium Wires are well suited for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) processes, and as oxygen and nitrogen scavengers in gas-filled and incandescent lamps.

High Purity Hafnium Wires Specifications:

High Purity Hafnium Wires Pictures:

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