Gold Sputter Target
Gold Sputter Target Description & Application
Gold is one of the most beautiful precious metals and an excellent conductor of heat and electricity. Gold Sputter Target is mainly made of high-quality gold material by smelting method or powder metallurgy method. It has excellent properties such as high density, good flexibility and ductility, excellent corrosion resistance, wear resistance and durability. The gold oxide film deposited by Gold Sputter Target can be used in the LED industry, semiconductor, solar energy, photovoltaic appliances, biological and chemical research fields, etc.
Application of Gold Sputtering Target in SEM Technology:
In scanning electron microscope coating technology, Gold Sputter Targets are the key raw materials, which can further help operators to better observe the changes and morphology of samples. From the difference in electrical conductivity, it can be divided into conductive samples and non-conductive samples. Conductive samples can be directly observed. For non-conductive samples, Gold Sputter Target is used to cover the sample with a thin layer of conductive material, which can not only prevent the sample from being charged by the electron beam in conventional SEM mode, but also further improve the observation effect and image contrast.
Gold Sputter Target Specifications:
Material | Gold(Au) |
Purity | 99.99-99.999% |
Size | Φ60mm |
Density | 19.2g/cm3 |
Melting Point | 1064 °C |
Surface | Milling,Grinding,Black,Bright Polished |
Delivery Time | 15-20 days |
Standard | ASTM,GB,ANSI |
Certification | ISO9001 |
Gold Sputter Target Pictures:


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