The sputtering target refers to the raw material used in the sputtering deposition process, which refers to the process of ejecting atoms from the solid target due to the bombardment of the target by high-energy particles, and its main function is to deposit a thin film on the workpiece . In late February, we delivered the high-quality Titanium Aluminum Sputtering Targets produced by us to our German customers safely and quickly by international express. German customers have always been satisfied with the metal products we provide and are willing to communicate with us on a technical level. The price and size specifications of the products also meet their requirements. Titanium Aluminum Sputtering Targets can be supplied with copper substrates or processed into other metal substrates if required.
Titanium Aluminum Alloy Sputtering Target is a very commonly used target, which can be produced by casting method and hot isostatic pressing method. It has high quality, high purity, uniform structure, long service life, good corrosion resistance, high thermal conductivity and Competitive price and other advantages. Titanium Aluminum Sputtering Targets are most commonly used in decorative coatings. They can deposit films with good hardness, high brightness, corrosion resistance, oxidation resistance, and fading resistance. They are widely used in hardware tool coatings, decorative coatings, and flat display coatings. layer, PVD and CVD processing, semiconductor components, and various magnetron sputtering machines and ion plating machines. FANMETL can also provide Aluminum Silicon Alloy Sputtering Target, Nickel Sputtering Target and Chromium Sputtering Target and other metal sputtering target products.
