Our company is very mature in the production and sales of sputtering targets and has obtained ISO certification. Spanish customers are our good partners and ordered a batch of Niobium Oxide Nb2O5 Sputtering Targets from us in early November. We determined the order quantity and customized size during the communication with Spanish customers, and the customers were very satisfied with our price and service attitude. After receiving the payment from the customer, we immediately started production and let the customer receive the product on time within the delivery period. Spanish customers are very satisfied with the product quality and processing technology, and said that they would cooperate with us again if there is a chance.
Niobium Oxide Target is generally made of niobium pentoxide material through powder metallurgy processing or magnetron sputtering technology. It has high density, high purity, minimum average grain size, good electrochemical stability and electronic transmission characteristics, high refractive index and low dispersion, high temperature resistance, corrosion resistance, durability and other excellent physical and chemical properties. Niobium Oxide Nb2O5 Sputtering Targets can produce high performance, high uniformity and high adhesion niobium oxide thin films, which are mainly used in semiconductors, solar energy, chemical vapor deposition (CVD) and physical vapor deposition (PVD) displays, nanotechnology and optical applications.
