Tungsten W Sputtering Round Targets

Tungsten W Sputtering Round Targets are made of high-purity tungsten materials through powder metallurgy processing and can be widely used in semiconductors, thin film deposition (such as solar cells, coatings of optical components and electronic components), light source industry, x-ray tubes (such as medical imaging and material analysis), etc. Our company has many years of professional experience in the production of non-ferrous metals, and our products have obtained ISO certification, so you can order them with confidence.

Tungsten W Sputtering Round Targets Advantage

1. As a high-density material, tungsten can effectively absorb the energy of electron beams and produce a variety of useful radiation and particle beams

2. High tensile strength, good ductility, and good processing performance

3. High melting point, high thermal conductivity, and high-temperature resistance

4. Corrosion resistance, wear resistance, and long service life

5. Using tungsten targets can obtain tungsten films with high purity, good uniformity, and precise thickness

Tungsten W Sputtering Round Targets Dimensions:

Tungsten W Sputtering Round Targets Pictures

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