99.95% Tungsten W Crucible
99.95% Tungsten W Crucible Description
Material selection and processing
Our company has advanced production equipment and a professional technical team. We can use sintering, stamping, welding, forging, chemical vapor deposition, and other processing methods for production.
Stamping is suitable for small or specific shape crucibles, with high production efficiency and high dimensional accuracy.
Welding is suitable for preparing large-sized thin-walled crucibles with relatively low cost but relatively low strength.
Forging and turning are suitable for making micro and small tungsten crucibles and can be processed into various fine sizes and shapes according to high-precision requirements.
Characteristics
- High purity can effectively avoid impurity contamination, especially in the field of semiconductor manufacturing, which has extremely high requirements
- High strength, high hardness, not easy to soften or crack, strong deformation resistance
- High melting point, excellent high temperature resistance, can maintain good structural integrity at high temperature
- Good chemical stability, high corrosion resistance to most chemicals such as acids, alkalis and salts
- Good electrical and thermal conductivity, which is conducive to improving crystallization efficiency and quality
- High dimensional accuracy, good processing performance, long service life
Application
99.95% Tungsten W Crucible can be widely used in metal smelting, semiconductor crystal growth, optical coating, solar cell manufacturing, electronic industry and scientific research.
- Used for smelting and preparation of high melting point metals, rare metals, high temperature alloys or special alloy materials.
- Used to grow high-quality, large-size semiconductor single crystal silicon crystals to meet the demand for raw materials in semiconductor chip manufacturing.
- Used to refine sapphire optical crystals for use in laser devices and optical windows.
- Used to hold coating materials, and evaporate the coating materials from the crucible through electron beam evaporation, thermal evaporation and other technologies to deposit them on the surface of electronic devices or optical components to form various functional films.
99.95% Tungsten W Crucible Parameter
|
Grade |
W1,W2 |
|
Purity |
>99.95% |
|
Diameter |
10-500mm |
|
Density |
18.5-19.3g/cm3 |
|
Height |
10-750mm |
|
Wall Thickness |
8-20mm |
|
Surface |
Polished, Grinding |
|
Delivery Time |
15-20 days |
|
Standard |
ASTM B760,ASTM B387,GB |
|
Certification |
ISO 9001 |
99.95% Tungsten W Crucible Pictures


Product Qualification

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