99.9% Purity Boron Target
99.9% Purity Boron Target Description
99.9% Purity Boron Target is a thin film deposition equipment made from high purity boron materials after a series of processing such as high temperature sintering, forging and rolling, polishing and cutting, which is usually used in fuel cells, decoration, semiconductors, displays, LED and photovoltaic equipment, glass coatings and other fields. 99.9% Purity Boron Target provides excellent properties in semiconductor manufacturing and magnetron sputtering. It can not only produce high-quality semiconductor films with various properties, but also provide deposition rate of magnetron sputtering and high purity and uniformity of thin film coatings. Our company can also provide other metal targets (such as tungsten, nickel, titanium), if you need, please feel free to email us.
99.9% Purity Boron Target Specifications:
|
Material |
Boron(B) |
|
Technique |
Hot isostatic pressing,Grain refinement,Sintering,Forging,Annealing |
|
Purity |
99.9% |
|
Size |
Discs( Dia ≤480mm,Thickness ≥ 1mm) |
|
Density |
2.34g/cm3 |
|
Surface |
Polished,Alkali Cleaning,Grinding,Black Oxide, etc. |
|
Certification |
ISO9001 |
99.9% Purity Boron Target Pictures:


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