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Titanium Aluminum Alloy PVD Targets/Titanium Sputtering Targets/Tial Alloy Target for Coating

Titanium Aluminum Alloy PVD Targets/Titanium Sputtering Targets/Tial Alloy Target for Coating

​FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )
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Product Details of Titanium Aluminum Alloy PVD Targets/Titanium Sputtering Targets/Tial Alloy Target for Coating

Product Introduction

We have determined the overall plan of technical reform development, and invested a lot of human, material and financial resources, new Hastelloy G30 Alloy Rod, Stellite 6k Blade, Pure Tungsten and technology innovation. Our company establishes high standard enterprise internal control standard and creates the core competitiveness of quality, innovation and service. We are committed to reducing costs, improving product quality, improving the skills and competitiveness of our employees, and making better use of our advantages.

FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )


The quality requirements of Titanium Aluminum Sputtering Target materials are higher than those of the traditional material industry. General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size and defect control; higher requirements or Special requirements include: surface roughness, resistance value, uniformity of grain size, uniformity of composition and structure, foreign matter (oxide) content and size, permeability, ultra-high density and ultra-fine grains, etc.

Titanium Aluminum Sputtering Target Picture:

Titanium Aluminum Sputtering Target

High Quality Titanium Aluminum Round Sputtering Target

Titanium Aluminum Sputtering Target Description

Purity

Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%,

AlTi 95/5wt%, AlTi 90/10wt%

Shape

Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm)
Rectangle, Sheet,

(Length ≤1000mm, Width ≤300mm, Thickness ≥1mm)
Tube( Diameter< 300mm, Thickness >2mm

Certification

ISO 9001:2008

Specification

Customized as request

Process

Forged , Rolling , Grinding

Application

1. Electroplating;

2. Chemical engineering & Petrochemical technology;

3. Medical

Density

4.51g/cm3

 

 

 

We are sincere to our customers, meet their needs with excellent Titanium Aluminum Alloy PVD Targets/Titanium Sputtering Targets/Tial Alloy Target for Coating, solve their problems and serve them wholeheartedly. As a leading enterprise in the industry, we finally have a sense of responsibility and mission to revitalize China's economy, to be steady and pragmatic, and to create brilliance again. We pursue the principles of teamwork and collectivism, and respect labor, knowledge, talent and creativity.

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