Name: Customized Platinum Sputtering Target Suppliers, Manufacturers, Factory - Wholesale Price - FANMETAL
Brand: FANMETAL
SKU: 157440172

We have established a complete set of quality assurance system to ensure that our Beryllium Copper Wire, Hastelloy G30 Alloy Rod, Cold Reduced Nickel Rod can meet the requirements of the international quality standard system. As a social organism, an enterprise must not only be a money making machine, but also have its own value pursuit. Customer satisfaction is a kind of psychological activity. It is the pleasure or state formed after the customer's needs are met. It is the customer's subjective feeling. The company has always adhered to the idea of emphasizing technology and innovation to improve production efficiency and optimize product performance with technological innovation.

Platinum Sputtering Target

FANMETAL supply the platinum sputtering target and other precious metal sputtering targets used in PVD coating system .Such as Au gold sputtering target , Ag silver sputtering target , Pt platinum sputtering target , Ir iridium sputtering target, Ru ruthenium sputtering target .

Specification for Platinum (Pt) Sputtering Target

Product Name	Platinum Sputtering Targets
Item Code	ST-PE78
Purity	99.95%-99.99%
Shape	Discs, Plates, Column Targets, Tubing Targets, Custom-made
Dimensions	Round sputtering target: Diameter: <18”, Thickness: >0.04” Rectangular sputtering target: Length: <36”, Width: <12”, Thickness: >0.04”
Bonding	Indium

Platinum Sputtering Target Picture

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Product Name	Element	Purirty	Melting Point ℃	Density (g/cc)	Available Shapes
High Pure Sliver	Ag	4N-5N	961	10.49	Wire, Sheet, Particle, Target
High Pure Aluminum	Al	4N-6N	660	2.7	Wire, Sheet, Particle, Target
High Pure Gold	Au	4N-5N	1062	19.32	Wire, Sheet, Particle, Target
High Pure Bismuth	Bi	5N-6N	271.4	9.79	Particle, Target
High Pure Cadmium	Cd	5N-7N	321.1	8.65	Particle, Target
High Pure Cobalt	Co	4N	1495	8.9	Particle, Target
High Pure Chromium	Cr	3N-4N	1890	7.2	Particle, Target
High Pure Copper	Cu	3N-6N	1083	8.92	Wire, Sheet, Particle, Target
High Pure Ferro	Fe	3N-4N	1535	7.86	Particle, Target
High Pure Germanium	Ge	5N-6N	937	5.35	Particle, Target
High Pure Indium	In	5N-6N	157	7.3	Particle, Target
High Pure Magnesium	Mg	4N	651	1.74	Wire, Particle, Target
High Pure Magnesium	Mn	3N	1244	7.2	Wire, Particle, Target
High Pure Molybdenum	Mo	4N	2617	10.22	Wire, Sheet, Particle, Target
High Pure Niobium	Nb	4N	2468	8.55	Wire, Target
High Pure Nickel	Ni	3N-5N	1453	8.9	Wire, Sheet, Particle, Target
High Pure Lead	Pb	4N-6N	328	11.34	Particle, Target
High Pure Palladium	Pd	3N-4N	1555	12.02	Wire, Sheet, Particle, Target
High Pure Platinum	Pt	3N-4N	1774	21.5	Wire, Sheet, Particle, Target
High Pure Silicon	Si	5N-7N	1410	2.42	Particle, Target
High Pure Tin	Sn	5N-6N	232	7.75	Wire, Particle, Target
High Pure Tantalum	Ta	4N	2996	16.6	Wire, Sheet, Particle, Target
High Pure Tellurium	Te	4N-6N	425	6.25	Particle, Target
High Pure Titanium	Ti	4N-5N	1675	4.5	Wire, Particle, Target
High Pure Tungsten	W	3N5-4N	3410	19.3	Wire, Sheet, Particle, Target
High Pure Zinc	Zn	4N-6N	419	7.14	Wire, Sheet, Particle, Target
High Pure Zirconium	Zr	4N	1477	6.4	Wire, Sheet, Particle, Target

High-purity and high-density sputtering targets include:

Sputtering target (purity: 99.9%-99.999%)

1. Metal target:

Nickel target, Ni, titanium target, Ti, zinc target, Zn, chromium target, Cr, magnesium target, Mg, niobium target, Nb, tin target, Sn, aluminum target, Al, indium target, In, iron target, Fe, Zirconium aluminum target, ZrAl, titanium aluminum target, TiAl, zirconium target, Zr, aluminum silicon target, AlSi, silicon target, Si, copper target Cu, tantalum target T, a, germanium target, Ge, silver target, Ag, cobalt target , Co, gold target, Au, gadolinium target, Gd, lanthanum target, La, yttrium target, Y, cerium target, Ce, tungsten target, w, stainless steel target, nickel-chromium target, NiCr, hafnium target, Hf, molybdenum target, Metal sputtering targets such as Mo, Fe-Ni targets, FeNi, Tungsten targets, and W targets.

We strive to transform our technologies into industry-leading Mini Compact Desktop Magnetron Plasma Sputtering Coater and services through sustained, focused and disciplined investment in industrialization. Our company believes in the principle of being a person first, doing things later, making friends first and doing business later. We are looking forward to cooperating with you sincerely, mutual benefit and creating a win-win situation. Our company constantly insists on innovation to realize the transformation from quantity advantage to quality advantage in export trade.

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