
High Purity Sputtering MOS2 Molybdic Sulfide Coating Target
Product Introduction
With the goal of becoming bigger and stronger, our factory hopes that customers will negotiate and develop together. We are willing to repay users with high-quality Titanium And Alloys, Zirconium Round Rod, Tungsten Rhenium Alloy Sheet and excellent service. We only produce good products that can withstand the test of time and provide customers with comprehensive solutions. Our company's strategic goal for the next five years is to attract, train and create a large number of diversified, complex and international high-quality professionals. While deepening various internal reforms of the enterprise, we also pay close attention to the adjustment of product structure and the improvement of product quality. Our company integrates modern enterprise management ideas and methods into the daily management of the enterprise.
Aluminum Zinc Oxide Sputtering Targets
Description:
Aluminum zinc oxide(AZO)sputtering target,that is,aluminum-doped zinc oxide target,contains three elements of Al,Zn and O,and is a transparent conductive oxide.The main production process is as follows:using high-quality ZnO and Al2O3 powder,then hot pressing,sintering,and finally bonding it to the bottom plate.Aluminum Zinc Oxide Sputtering Targets manufactured by the hot pressing method has the advantages of low resistivity,high wear resistance,high density, uniform microstructure,fine grain size,and smooth surface.
Application:
Sputtering is an established technique capable of depositing thin films from a wide variety of materials to different substrate shapes and sizes.Aluminum Zinc Oxide Sputtering Targets are often used for thin film deposition, and the preparation of AZO thin films can be performed by radio frequency or DC magnetron sputtering.Because Aluminum Zinc Oxide films have high transmittance and low resistivity in the visible region,and are inexpensive and non-toxic,they are widely used in solar cells,glass coatings (architectural glass and automotive glass),thin film and photovoltaic industry,electronic displays (such as Flat panel displays),LED,and photoelectric are particularly popular and can replace many of the functions of ITO.
Aluminum Zinc Oxide Sputtering Targets With the development of transparent conductive films, AZO (Al2O3-ZnO) targets, which can replace ITO, have been widely used. The AZO transparent conductive film has a band gap of 3.4eV and an intrinsic absorption limit of 360nm, which can be used as a window layer material for thin-film batteries. Its wide band gap feature can reduce the absorption of light by p, n-type doped regions and improve the utilization rate of light energy. At the same time, the AZO transparent conductive film has low resistivity and high visible light transmittance, making it a good front transparent layer material. At the same time, AZO also has the characteristics of high plasma stability, easy preparation technology, and non-toxic and harmless raw materials, making AZO more widely used in the field of thin-film solar cells.
Aluminum Zinc Oxide Sputtering Targets Picture:


Our company can provide customers with high-purity, high-density, and uniformly organized AZO targets, as well as the binding service of AZO targets and backplanes.
Type | Product Name | Formula | Purity | Melting Point | Density (g/cc) | Available Shapes |
Oxides | Aluminium Oxide | Al2O3 | 4N | 2045 | 4 | Target, Particle |
Bismuth(III) Oxide | Bi2O3 | 4N | 820 | 8.9 | Target, Particle | |
Chromium(III) Oxide | Cr2O3 | 4N | 2435 | 5.2 | Target, Particle | |
Erbium Oxide | Er2O3 | 4N | 2378 | 8.64 | Target, Particle | |
Hafnium Oxide | HfO2 | 4N | 2812 | 9.7 | Target, Particle | |
Indium Tin Oxide | ITO | 4N | 1565 | 7.6 | Target | |
Magnesium Oxide | MgO | 4N | 2800 | 3.58 | Target, Particle | |
Niobium Pentoxide | Nb2O5 | 4N | 1530 | 4.47 | Target, Particle | |
Neodymium(III) Oxide | Nd2O3 | 4N | 2272 | 7.2 | Target, Particle | |
Nickel Oxide | NiO | 4N | 1990 | 7.45 | Target, Particle | |
Scandium Oxide | Sc2O3 | 4N | 2480 | 3.86 | Target, Particle | |
Silicon Oxide | SiO | 4N | 1702 | 2.13 | Target, Particle | |
Silicon Dioxide | SiO2 | 4N | 1610 | 2.2 | Target, Particle, Crystal | |
Samarium(III) Oxide | Sm2O3 | 4N | 2350 | 7.4 | Target, Particle | |
Tantalum Pentoxide | Ta2O5 | 4N | 1800 | 8.7 | Target, Particle | |
Titanium Dioxide | TiO2 | 4N | 1800 | 4.29 | Target, Particle | |
Titanium (V) Oxide | Ti3O5 | 4N | 1750 | 4.57 | Target, Particle | |
Vanadium(V) Oxide | V2O5 | 4N | 690 | 3.36 | Target, Particle | |
Yttrium(III) Oxide | Y2O3 | 4N | 2680 | 4.8 | Target, Particle | |
Zinc Oxide | ZnO | 4N | 1975 | 5.6 | Target, Particle | |
Aluminium-doped Zinc Oxide | AZO | 4N | \ | 5.4 | Target | |
Zirconium Dioxide | ZrO2 | 4N | 2700 | 5.5 | Target, Particle | |
Fluoride | Barium Fluoride | BaF2 | 4N | 1280 | 4.8 | Target, Particle |
Calcium Fluoride | CaF2 | 4N | 1360 | 3.13 | Target, Particle | |
Cerium Fluoride | CeF3 | 4N | 1418 | 6.16 | Target, Particle | |
Potassium Fluoride | KF | 4N | 880 | 2.48 | Target, Particle | |
Lanthanum(III) Fluoride | LaF3 | 4N | 1490 | 6 | Target, Particle | |
Magnesium Fluoride | MgF2 | 4N | 1266 | 4.2 | Target, Particle | |
Sodium Fluoride | NaF | 4N | 988 | 2.79 | Target, Particle | |
Others | Barium Titanate | BaTiO3 | 4N | 1620 | 3.96 | Target, Particle |
Strontium Titanate | SrTiO3 | 4N | 2080 | 5.12 | Target, Particle | |
Zinc Sulfide | ZnS | 4N | 1830 | 4.1 | Target, Particle | |
Silicon Nitride | Si3N4 | 4N | sublimation | 3.44 | Target, Particle | |
Titanium Nitride | TiN | 4N | 2950 | 5.43 | Target, Particle | |
Aluminium Nitride | AlN | 4N | sublimation | 3.26 | Target, Particle | |
Boron Nitride | BN | 4N | 3000 | 2.25 | Target, Particle | |
Slilicon Carbide | SiC | 4N | 2700 | 3.22 | Target |
The sustainable development we advocate is to provide clean and reliable High Purity Sputtering MOS2 Molybdic Sulfide Coating Target to society in a responsible and sustainable manner. Our company has accumulated a large number of loyal customers with the business policy of 'quality first, service first, customer first, integrity first', and received unanimous praise from customers. We have established long-term cooperative relationship with many famous enterprises. We offer competitive salary, comprehensive social welfare and vocational training opportunities.
Hot Tags: Aluminum Zinc Oxide Sputtering Targets, suppliers, manufacturers, factory, customized, wholesale, price, quotation, for sale, WCu Cylindrical Sleeve, Beryllium Copper Rod, Pure Tungsten Pipe, Hastelloy G30 Alloy Rod, nb target, tungsten W disc
[[ProKeywords]]SPEC DATA
Send Inquiry