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ACETRON 99.6% High Purity Titanium+Aluminum Sputtering Target for Vacuum/PVD Coating

ACETRON 99.6% High Purity Titanium+Aluminum Sputtering Target for Vacuum/PVD Coating

​FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )
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Product Details of ACETRON 99.6% High Purity Titanium+Aluminum Sputtering Target for Vacuum/PVD Coating

Product Introduction

We adhere to the purpose of repaying customers and society with the best Pure Iridium Wire, Tungsten Copper Plate, Beryllium Copper Rod, and have accomplished the mission of developing different periods of goals. The company regards quality as the life of the company and is solely responsible for the products sold during the life cycle. We always insist on sharing the fruits of development with our employees and benefiting every employee from the achievements of our company.

FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )


The quality requirements of Titanium Aluminum Sputtering Target materials are higher than those of the traditional material industry. General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size and defect control; higher requirements or Special requirements include: surface roughness, resistance value, uniformity of grain size, uniformity of composition and structure, foreign matter (oxide) content and size, permeability, ultra-high density and ultra-fine grains, etc.

Titanium Aluminum Sputtering Target Picture:

Titanium Aluminum Sputtering Target

High Quality Titanium Aluminum Round Sputtering Target

Titanium Aluminum Sputtering Target Description

Purity

Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%,

AlTi 95/5wt%, AlTi 90/10wt%

Shape

Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm)
Rectangle, Sheet,

(Length ≤1000mm, Width ≤300mm, Thickness ≥1mm)
Tube( Diameter< 300mm, Thickness >2mm

Certification

ISO 9001:2008

Specification

Customized as request

Process

Forged , Rolling , Grinding

Application

1. Electroplating;

2. Chemical engineering & Petrochemical technology;

3. Medical

Density

4.51g/cm3

 

 

 

We provide customers with value-added services with low price and high-quality ACETRON 99.6% High Purity Titanium+Aluminum Sputtering Target for Vacuum/PVD Coating. We uphold the spirit of honesty, quality, and never give up. We optimize and adjust the industrial structure, continuously improve quality and efficiency, and strive to build the company into an excellent enterprise with advanced management and technological innovation. We are full of passion and dreams, with innovation as our will, never satisfied, and constantly create new miracles.

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