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ACETRON 99.6% High Purity Titanium+Aluminum Round Target for Vacuum/PVD Coating

ACETRON 99.6% High Purity Titanium+Aluminum Round Target for Vacuum/PVD Coating

​FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )
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Product Details of ACETRON 99.6% High Purity Titanium+Aluminum Round Target for Vacuum/PVD Coating

Product Introduction

We cherish the quality of our products as if we cherish our own life. Starting from the raw material company, we have implemented the system of checking at all levels. The quality of our Zr 2 5nb Zirconium Niobium Alloy Rod, Asme B16 9 Titanium Pipe Fittings, Beryllium Copper Wire has been steadily improved and improved for many years. We always adhere to the concept of green development, firm the path of green development, and practice the new mode of environmental management. With a wide range, good quality, reasonable prices and stylish designs, our products are extensively used in this industries and other industries. Start from bit by bit, start from ourselves to improve our products and services, and build a people-oriented harmonious enterprise and society.

FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )


The quality requirements of Titanium Aluminum Sputtering Target materials are higher than those of the traditional material industry. General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size and defect control; higher requirements or Special requirements include: surface roughness, resistance value, uniformity of grain size, uniformity of composition and structure, foreign matter (oxide) content and size, permeability, ultra-high density and ultra-fine grains, etc.

Titanium Aluminum Sputtering Target Picture:

Titanium Aluminum Sputtering Target

High Quality Titanium Aluminum Round Sputtering Target

Titanium Aluminum Sputtering Target Description

Purity

Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%,

AlTi 95/5wt%, AlTi 90/10wt%

Shape

Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm)
Rectangle, Sheet,

(Length ≤1000mm, Width ≤300mm, Thickness ≥1mm)
Tube( Diameter< 300mm, Thickness >2mm

Certification

ISO 9001:2008

Specification

Customized as request

Process

Forged , Rolling , Grinding

Application

1. Electroplating;

2. Chemical engineering & Petrochemical technology;

3. Medical

Density

4.51g/cm3

 

 

 

Our destination is 'You come here with difficulty and we supply you with a smile to take away' for ACETRON 99.6% High Purity Titanium+Aluminum Round Target for Vacuum/PVD Coating. With the rigorous manufacturing process, advanced management concept, professional production team and the spirit of continuous development and innovation, our products are of high quality and low price, highly competitive in the market, and our products are widely spread in every corner of the world. Our company takes independent innovation as the driving force, actively absorbs domestic and foreign technology and experience, and constantly develops and innovates.

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