
ACETRON 99.6% High Purity Ti+Al Planar Sputtering Target for Vacuum/PVD Coating
Product Introduction
Our company will build an independent brand in the Pure 99 999 Titanium Sputtering Target, cold rolled Titanium sheet, Tungsten Copper Plate industry with the enterprise spirit of "honesty, stability, objectivity and professionalism". In recent years, with our company's honesty and good management style and reliable product quality, it has been widely recognized and welcomed by users from all walks of life, forming a good market and reputation. It is necessary for us to take the pursuit of cultural connotation as a conscious ideology to motivate and regulate our actions. We are committed to creating a climate of innovation that inspires both the organization and individuals. Our strength comes from our continuous growth, we directly give profits to customers, sell at a low price.
FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )
The quality requirements of Titanium Aluminum Sputtering Target materials are higher than those of the traditional material industry. General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size and defect control; higher requirements or Special requirements include: surface roughness, resistance value, uniformity of grain size, uniformity of composition and structure, foreign matter (oxide) content and size, permeability, ultra-high density and ultra-fine grains, etc.
Titanium Aluminum Sputtering Target Picture:


Titanium Aluminum Sputtering Target Description
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Purity |
Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%, AlTi 95/5wt%, AlTi 90/10wt% |
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Shape |
Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm) (Length ≤1000mm, Width ≤300mm, Thickness ≥1mm) |
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Certification |
ISO 9001:2008 |
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Specification |
Customized as request |
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Process |
Forged , Rolling , Grinding |
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Application |
1. Electroplating; 2. Chemical engineering & Petrochemical technology; 3. Medical |
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Density |
4.51g/cm3 |
Our ACETRON 99.6% High Purity Ti+Al Planar Sputtering Target for Vacuum/PVD Coating is favored by customers in many countries and regions, and the company's performance continues to grow steadily. We always insist on creating development space for employees and realizing life value; for shareholders, we respect the rights and interests of shareholders and provide stable returns. We advocate the "Lei Feng spirit" and give reasonable returns to the devotees; we advocate the integration of resources in the agricultural industry value chain, focusing on the co-creation and sharing of benefits. We always carry a grateful heart, actively fulfill our corporate mission and take up social responsibility.
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