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ACETRON 3N 99.9% High Purity Titanium+Aluminum Sputtering Target for Vacuum/PVD Coating

ACETRON 3N 99.9% High Purity Titanium+Aluminum Sputtering Target for Vacuum/PVD Coating

​FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )
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Product Details of ACETRON 3N 99.9% High Purity Titanium+Aluminum Sputtering Target for Vacuum/PVD Coating

Product Introduction

Looking forward to the future, we will continue to forge ahead, hoping to spread our original ideas and methods to the world and become one of the most respected companies in the Medical Titanium, stellite alloys, Inconel 718 Forging Block industry in China. We have a strong production technical strength and good business reputation. We aim to serve global customers, tailor-made, help customers solve problems, and try to meet all customer needs. We always have lofty ideals and ambitions in our hearts, and always keep in mind the responsibilities and missions of the team, and move forward with our feet down-to-earth. Our company adheres to the business philosophy of 'integrate resources, optimize channels, serve customers, and win-win cooperation', and is committed to providing customers with first-class products and services, thereby saving the costs of customers.

FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )


The quality requirements of Titanium Aluminum Sputtering Target materials are higher than those of the traditional material industry. General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size and defect control; higher requirements or Special requirements include: surface roughness, resistance value, uniformity of grain size, uniformity of composition and structure, foreign matter (oxide) content and size, permeability, ultra-high density and ultra-fine grains, etc.

Titanium Aluminum Sputtering Target Picture:

Titanium Aluminum Sputtering Target

High Quality Titanium Aluminum Round Sputtering Target

Titanium Aluminum Sputtering Target Description

Purity

Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%,

AlTi 95/5wt%, AlTi 90/10wt%

Shape

Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm)
Rectangle, Sheet,

(Length ≤1000mm, Width ≤300mm, Thickness ≥1mm)
Tube( Diameter< 300mm, Thickness >2mm

Certification

ISO 9001:2008

Specification

Customized as request

Process

Forged , Rolling , Grinding

Application

1. Electroplating;

2. Chemical engineering & Petrochemical technology;

3. Medical

Density

4.51g/cm3

 

 

 

We will ensure the effective implementation of various services, so as to improve the after-sales service and ACETRON 3N 99.9% High Purity Titanium+Aluminum Sputtering Target for Vacuum/PVD Coating quality. We wholeheartedly develop new high quality products for our customers and wholeheartedly meet their different demands for products, our philosophy is no best, only better. We welcome potential buyers to contact us.

Hot Tags: Titanium Aluminum Sputtering Target, suppliers, manufacturers, factory, customized, wholesale, price, quotation, for sale, Stellite cutting tools, Molybdenum Mo Sheet, Carbide Strip, 2 CERIUM TUNGSTEN ELECTRODE, ernicrmo 3 filler wire, tungsten carbide rolls for rolling mills

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