
ACETRON 3N 99.9% High Purity Ti+Al Sputtering Target for Vacuum/PVD Coating
Product Introduction
We'll make every effort and hard work to be superb and excellent, and speed up our steps for Tungsten Carbide Button Teeth, Tungsten Heavy Alloy Balancing Weight, Pure Molybdenum Threaded Rod. Under the effect of market economy, our business scope has been expanded to the major regions and cities in the country, we are anxious about the urgent needs of users, think what users think. With a professional and unique technical team, rich industry experience, and leading innovation concepts, we provide customers in different industries with "tailor-made" personalized solutions, and have successfully provided excellent equipment and perfect services to many well-known domestic and foreign companies. We focus on the layout of the overall goal of high-quality development, fill the shortcomings, strong advantages, and create the future with quality.
FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )
The quality requirements of Titanium Aluminum Sputtering Target materials are higher than those of the traditional material industry. General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size and defect control; higher requirements or Special requirements include: surface roughness, resistance value, uniformity of grain size, uniformity of composition and structure, foreign matter (oxide) content and size, permeability, ultra-high density and ultra-fine grains, etc.
Titanium Aluminum Sputtering Target Picture:


Titanium Aluminum Sputtering Target Description
|
Purity |
Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%, AlTi 95/5wt%, AlTi 90/10wt% |
|
Shape |
Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm) (Length ≤1000mm, Width ≤300mm, Thickness ≥1mm) |
|
Certification |
ISO 9001:2008 |
|
Specification |
Customized as request |
|
Process |
Forged , Rolling , Grinding |
|
Application |
1. Electroplating; 2. Chemical engineering & Petrochemical technology; 3. Medical |
|
Density |
4.51g/cm3 |
Our company uses the open economic environment to carry out more international exchanges and cooperation, introduces advanced technology, and promotes its ACETRON 3N 99.9% High Purity Ti+Al Sputtering Target for Vacuum/PVD Coating to the international market. Our company consists of R & D department, sales department, international trade department and after-sales service department. We strive to integrate the construction of corporate culture into brand building, quality management and social responsibility, and further strengthen the cultural integration of all types of enterprises.
Hot Tags: Titanium Aluminum Sputtering Target, suppliers, manufacturers, factory, customized, wholesale, price, quotation, for sale, Industrial Titanium Flange, Industrial Titanium Forging, Homo Valve For Homogenizer, Tungsten metalizing filaments, iridium round bar, Precision Parts Made From Stainless Steel
[[ProKeywords]]SPEC DATA
Send Inquiry