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ACETRON 3N 99.9% High Purity Ti+Al Planar Sputtering Target for Vacuum/PVD Coating

ACETRON 3N 99.9% High Purity Ti+Al Planar Sputtering Target for Vacuum/PVD Coating

​FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )
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Product Details of ACETRON 3N 99.9% High Purity Ti+Al Planar Sputtering Target for Vacuum/PVD Coating

Product Introduction

We are committed to providing our customers with the best quality Tungsten Rhenium Alloy Rod, Inconel 625 Alloy Rod, Industrial Titanium Forging and services, and to taking the interests of our customers as our responsibility to achieve mutual benefits and win-win cooperation! In order to improve our product innovation ability, we put forward the product development concept of knowledge driven collaborative innovation. We are driven by sales purposes, all for the sake of front-line sales, and effectively mobilize all-round resources.

FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )


The quality requirements of Titanium Aluminum Sputtering Target materials are higher than those of the traditional material industry. General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size and defect control; higher requirements or Special requirements include: surface roughness, resistance value, uniformity of grain size, uniformity of composition and structure, foreign matter (oxide) content and size, permeability, ultra-high density and ultra-fine grains, etc.

Titanium Aluminum Sputtering Target Picture:

Titanium Aluminum Sputtering Target

High Quality Titanium Aluminum Round Sputtering Target

Titanium Aluminum Sputtering Target Description

Purity

Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%,

AlTi 95/5wt%, AlTi 90/10wt%

Shape

Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm)
Rectangle, Sheet,

(Length ≤1000mm, Width ≤300mm, Thickness ≥1mm)
Tube( Diameter< 300mm, Thickness >2mm

Certification

ISO 9001:2008

Specification

Customized as request

Process

Forged , Rolling , Grinding

Application

1. Electroplating;

2. Chemical engineering & Petrochemical technology;

3. Medical

Density

4.51g/cm3

 

 

 

Our ACETRON 3N 99.9% High Purity Ti+Al Planar Sputtering Target for Vacuum/PVD Coating is more competitive than other brands in terms of quality, reliability, and diversity. Since the establishment of our company, always adhering to the customer first, excellence, integrity management ideal, to create more value for customers is our purpose. Provide customers with high-quality home life with high-quality products; bring more product value returns to partners, distributors, etc.

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