Molybdenum Ion Implantation Part
Molybdenum Ion Implantation Part Description
Ion implantation is the key to manufacturing semiconductor devices, and when the ion beam is directed onto the semiconductor surface and deposited, the carrier concentration and conductive type change. Molybdenum Implantation Part is made of high-quality molybdenum material through powder metallurgy process, with high melting point, high strength, high injection precision, corrosion resistance, high thermal conductivity, high melting point, low thermal expansion coefficient, excellent surface modification function, long service life and other advantages. The Molybdenum Ion Implantation Part can be used to manufacture various semiconductor devices, such as transistors, integrated circuits, microelectronic devices, solar cells, etc., which can control its electrical and chemical properties to achieve specific functions of semiconductor devices. Molybdenum Ion Implantation Part is often used in ion implantation, electric light source industry, sapphire refining industry, ceramics industry and polymer fields.
Molybdenum Ion Implantation Part Specifications:
|
Grade |
Mo,TZM,MLA,361 |
|
Technique |
Hot Rolling,Forging,Flattening,Annealing,Machining |
|
Melting Point |
2610℃ |
|
Purity |
Mo≥99.95% |
|
Size and Shape |
According to drawings |
|
Density |
10.2g/cm3 |
|
Surface |
Polishing, Anodizing, Zinc plating,Chemical Cleaning,Powder coating, etc. |
|
Standard |
ASTM B777,DIN,GB |
|
Certification |
ISO9001 |
Molybdenum Ion Implantation Part Pictures:


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